Optical and electrical properties of p-type ZnO fabricated by NH3 plasma post-treated ZnO thin films-Reference-Cited by-同舟云学术

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Optical and electrical properties of p-type ZnO fabricated by NH3 plasma post-treated ZnO thin films

Published:2008-02 Issue:9 Volume:254 Page:2900-2904
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Cao P.,Zhao D.X.,Zhang J.Y.,Shen D.Z.,Lu Y.M.,Yao B.,Li B.H.,Bai Y.,Fan X.W.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference30 articles.

1. Properties of nitrogen-implanted p-type ZnO films grown on Si3N4/Si by radio-frequency magnetron sputtering

2. Realization of p-type ZnO thin films via phosphorus doping and thermal activation of the dopant

3. Synthesis of p-type ZnO films

4. Photoluminescence study of Sb-doped p-type ZnO films by molecular-beam epitaxy

5. Dopant source choice for formation of p-type ZnO: Li acceptor

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