GeSbTe deposition for the PRAM application-Reference-Cited by-同舟云学术

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GeSbTe deposition for the PRAM application

Published:2007-02 Issue:8 Volume:253 Page:3969-3976
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Lee Junghyun,Choi Sangjoon,Lee Changsoo,Kang Yoonho,Kim Daeil

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference8 articles.

1. International Electron Devices Meeting;Horii,2001

2. International Electron Devices Meeting;Lai,2001

3. S. L. Cho, VLSI Symposium Technology Digest of Technical Papers 6B-1, 2005, p. 96.

4. The Manipulation of Air Sensitive Compounds;Shriver,1986

5. Growth of GaSb using trisdimethylaminoantimony

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