Medium energy Ar+-ion induced ripple formation: Role of ion energy in pattern formation-Reference-Cited by-同舟云学术

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Medium energy Ar+-ion induced ripple formation: Role of ion energy in pattern formation

Published:2014-10 Issue: Volume:317 Page:476-479
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Garg S.K.,Datta D.P.,Ghatak J.,Tripathy S.R.,Kanjilal D.,Som T.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference27 articles.

1. The equilibrium topography of sputtered amorphous solids

2. Theory of ripple topography induced by ion bombardment

3. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

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