Excellent resistive switching property and physical mechanism of amorphous TiO2 thin films fabricated by a low-temperature photochemical solution deposition method-Reference-Cited by-同舟云学术

Excellent resistive switching property and physical mechanism of amorphous TiO2 thin films fabricated by a low-temperature photochemical solution deposition method

Published:2014-08 Issue: Volume:311 Page:697-702
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zou Lilan,Hu Wei,Xie Wei,Chen Ruqi,Qin Ni,Li Baojun,Bao Dinghua

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

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