Influence of ion bombardment on structure and properties of TiZrN thin film
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference18 articles.
1. The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films
2. Reactive magnetron sputtering deposition of TiN films. II. Influence of substrate temperature on the mechanical properties of the films
3. Influence of residual stresses on the mechanical properties of TiCxN1–x (x=0, 0.15, 0.45) thin films deposited by arc evaporation
4. Deposition and characterization of TiAlZrN films produced by a combined steered arc and unbalanced magnetron sputtering technique
5. Tribological studies of Zr-implanted PVD TiN coatings deposited on stainless steel substrates
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