Organic adlayer on inorganic materials: XPS analysis selectivity to cope with adventitious contamination-Reference-Cited by-同舟云学术

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Organic adlayer on inorganic materials: XPS analysis selectivity to cope with adventitious contamination

Published:2016-10 Issue: Volume:383 Page:71-83
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Landoulsi Jessem,Genet Michel J.,Fleith Sandrine,Touré Yetioman,Liascukiene Irma,Méthivier Christophe,Rouxhet Paul G.

Funder

National Foundation for Scientific Research

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference50 articles.

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2. Carbon incorporation during the dielectric breakdown process of silicon oxide;Najmi;Surf. Interface Anal.,1997

3. Kinetics and mechanism of carbon incorporation in ultrathin silicon-based dielectric films;Rana;J. Electrochem. Soc.,2002

4. Adsorption behavior of organic contaminants on a silicon wafer surface;Sugimoto;J. Electrochem. Soc.,1999

5. Role of surface chemistry in semiconductor thin film processing;Ekerdt;Chem. Rev.,1996

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