Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles-Reference-Cited by-同舟云学术

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Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles

Published:2010-10 Issue:1 Volume:257 Page:186-191
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Alekhin A.P.,Gudkova S.A.,Markeev A.M.,Mitiaev A.S.,Sigarev A.A.,Toknova V.F.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference21 articles.

1. Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates

2. Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water

3. In Vitro Bioactivity of Atomic Layer Deposited Titanium Dioxide on Titanium and Silicon Substrates

4. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

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