Influence of ejection angle on residual stress and optical properties of sputtering Ta2O5 thin films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference21 articles.
1. Temperature-stable bandpass filters deposited with plasma ion-assisted deposition
2. Antireflecting coating from Ta2O5 and SiO2 multilayer films
3. Chemical Vapor Deposition of Tantalum Oxide from Tetraethoxo(β-diketonato)tantalum(V) Complexes
4. Effect of thermal stresses on temperature dependence of refractive index for Ta2O5 dielectric films
5. The Effect of Ejection Angle in Ion-Beam Sputter Deposition of Superconducting Amorphous Beryllium Film
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1. High-performance Ta2O5 films prepared by plasma ion-assisted deposition for low-absorption optics;Optics Continuum;2024-09-11
2. Study on the surface modification of Ta2O5 bombarded by argon ions;Optical Materials Express;2022-11-07
3. Reconfigurable flat-top narrow bandpass filter in prism pair coupled planar optical waveguide;Optics Communications;2020-03
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