Fabrication and characterization of periodic arrays of epitaxial Ni-silicide nanocontacts on (110)Si
Author:
Funder
Ministry of Science and Technology of Taiwan, ROC
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference26 articles.
1. Salicides: materials, scaling and manufacturability issues for future integrated circuits (invited)
2. Formation of microcrystalline-Si thin film transistors by using self-aligned nickel-silicided process
3. Ni- and Co-based silicides for advanced CMOS applications
4. Progress in the understanding of Ni silicide formation for advanced MOS structures
5. Epitaxial growth of NiSi[sub 2] on (001)Si inside nanoscale contact holes prepared by atomic force microscope tip-induced local oxidation of the thin Si[sub 3]N[sub 4] layer
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