In situ growth of Ge-rich poly-SiGe:H thin films on glass by RF magnetron sputtering for photovoltaic applications-Reference-Cited by-同舟云学术

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In situ growth of Ge-rich poly-SiGe:H thin films on glass by RF magnetron sputtering for photovoltaic applications

Published:2011-02 Issue:9 Volume:257 Page:4354-4359
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Tsao Chao-Yang,Liu Ziheng,Hao Xiaojing,Green Martin A.

Funder

ARC Photovoltaics Centre of Excellence, UNSW

Taiwan Power Company

Asia-Pacific Partnership on Clean Development and Climate

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference28 articles.

1. Low-temperature growth of polycrystalline Ge thin film on glass by in situ deposition and ex situ solid-phase crystallization for photovoltaic applications;Tsao;Appl. Surf. Sci.,2009

2. In situ low temperature growth of poly-crystalline germanium thin film on glass by RF magnetron sputtering;Tsao;Sol. Energy Mater. Sol. Cells,2010

3. Influence of hydrogen on structural and optical properties of low temperature polycrystalline Ge films deposited by RF magnetron sputtering;Tsao;J. Cryst. Growth,2010

4. Structural and optoelectronic properties of Ge-rich hydrogenated amorphous silicon-germanium alloys;Graeff;J. Appl. Phys.,1994

5. Germanium-rich silicon-germanium films epitaxially grown by ultrahigh vacuum chemical-vapor deposition directly on silicon substrates;Cannon;Appl. Phys. Lett.,2007

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