Influence of primary ion beam irradiation conditions on the depth profile of hydrogen in tantalum film-Reference-Cited by-同舟云学术

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Influence of primary ion beam irradiation conditions on the depth profile of hydrogen in tantalum film

Published:2008-12 Issue:4 Volume:255 Page:1387-1390
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Asakawa T.,Nagano D.,Denda S.,Miyairi K.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference7 articles.

1. Quantitative Analysis of Deuterium in Ti, Ti Alloys, Zr, V, Nb and Ta by Ion Microanalyzer

2. Secondary Ion Mass Spectrometry SIMS IX;Li-Fatou,1994

3. Secondary Ion Mass Spectrometry SIMS XI;Li-Fatou,1998

4. Distribution of hydrogen in the NPL standard ta2O5 films

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3. Absorption, discharge, and internal partitioning behavior of hydrogen in the tantalum and tantalum oxide system investigated by in situ oxidation SIMS and ab initio calculations;Journal of Vacuum Science & Technology B;2020-05

4. Methane plasma-based ion implantation of metallic and galvanically oxidized tantalum;Surface and Coatings Technology;2011-11

5. Atomic spectrometry update. Industrial analysis: metals, chemicals and advanced materials;Journal of Analytical Atomic Spectrometry;2010

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