Self-limiting Sb monolayer as a diffusion source for Ge doping-Reference-Cited by-同舟云学术

Self-limiting Sb monolayer as a diffusion source for Ge doping

Published:2019-12 Issue: Volume:496 Page:143713
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Sgarbossa Francesco^ORCID,Maggioni Gianluigi^ORCID,Rizzi Gian Andrea^ORCID,Carturan Sara Maria,Napolitani Enrico^ORCID,Raniero Walter,Carraro Chiara,Bondino Federica^ORCID,Píš Igor^ORCID,De Salvador Davide

Funder

Horizon 2020

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference59 articles.

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3. Chemical approaches for doping nanodevice architectures;Connell;Nanotechnology,2016

4. Monolayer doping of germanium by phosphorus containing molecules;Sgarbossa;Nanotechnology,2018

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