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High crystalline aluminum nitride via highly enhanced adatom diffusion driven by point defect complex

  • Published:2020-03 Issue: Volume:505 Page:144615
  • ISSN:0169-4332
  • Container-title:Applied Surface Science
  • language:en
  • Short-container-title:Applied Surface Science

Author:

Lee MoonsangORCID,Yang Mino,Lee Hae-Yong,Lee Hyun UkORCID,Kim HeejinORCID,Park Sungsoo

Funder

Korea Basic Science Institute Research

National Research Foundation of Korea

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference39 articles.

1. Using mosaicity to tune thermal transport in polycrystalline aluminum nitride thin films;Shahab;ACS Appl. Mater. Interfaces,2018

2. Direct growth and controlled coalescence of thick AlN template on micro-circle patterned Si substrate;Tran;Sci. Rep.,2015

3. Hydride vapor phase epitaxy of AlN using a high temperature hot-wall reactor;Baker;J. Cryst. Growth,2014

4. Initial nucleation of AlN grown directly on sapphire substrates by metal-organic vapor phase epitaxy;Banal;Appl. Phys. Lett.,2008

5. Defects induced broad spectral photoresponse of PVT-grown bulk AlN crystals;Liu;Scripta Mater.,2018

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