Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical-mechanical polishing mechanism-Reference-Cited by-同舟云学术

Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical-mechanical polishing mechanism

Published:2020-01 Issue: Volume:500 Page:144041
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Shi Xiao-Lei,Chen Gaopan,Xu Li,Kang Chengxi,Luo Guihai,Luo Haimei,Zhou Yan,Dargusch Matthew S.,Pan Guoshun

Funder

Science Challenge Project

National Natural Science Foundation of China

Science and Technology Planning Project of Guangdong Province of China

Science, Technology and Innovation Commission of Shenzhen Municipality

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference54 articles.

1. Three-dimensional printing of transparent fused silica glass

2. Index of Refraction of Fused Quartz Glass for Ultraviolet, Visible, and Infrared Wavelengths*†

3. A novel temperature-insensitive optical fiber pressure sensor for harsh environments

4. Very Low Thermal Expansion Coefficient Materials

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