The effect of amino acid addition in CeO2-based slurry on SiO2/Si3N4 CMP: Removal rate selectivity, morphology, and mechanism research
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Published:2024-10
Issue:
Volume:412
Page:125855
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ISSN:0167-7322
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Container-title:Journal of Molecular Liquids
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language:en
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Short-container-title:Journal of Molecular Liquids
Author:
Han XinyuORCID,
Zhang ShihaoORCID,
Liu RenhaoORCID,
Wang Fangyuan,
Tan BaimeiORCID,
Zhao Xinyu,
Zhao Jiadong,
Shi Yunhui
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