The influences of high energetic oxygen negative ions and active oxygen on the microstructure and electrical properties of ZnO:Al films by MF magnetron sputtering-Reference-Cited by-同舟云学术

The influences of high energetic oxygen negative ions and active oxygen on the microstructure and electrical properties of ZnO:Al films by MF magnetron sputtering

Published:2012-08 Issue:20 Volume:258 Page:8234-8240
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Hao Changshan,Xie Bin,Li Ming,Wang Haiqian,Jiang Yousong,Song Yizhou

Funder

National science Foundation of China

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference20 articles.

1. Aluminum-doped zinc oxide films as transparent conductive electrode for organic light-emitting devices

2. Transparent conductive Al-doped ZnO films for liquid crystal displays

3. Organic solar cells on indium tin oxide and aluminum doped zinc oxide anodes

4. Optical properties of sputter‐deposited ZnO:Al thin films

5. Photoresponse of Si detector based on n-ZnO/p-Si and n-ZnO/n-Si structures

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