Fractal analysis and atomic force microscopy measurements of surface roughness for Hastelloy C276 substrates and amorphous alumina buffer layers in coated conductors-Reference-Cited by-同舟云学术

Fractal analysis and atomic force microscopy measurements of surface roughness for Hastelloy C276 substrates and amorphous alumina buffer layers in coated conductors

Published:2012-02 Issue:8 Volume:258 Page:3502-3508
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Feng F.,Shi K.,Xiao S.-Z.,Zhang Y.-Y.,Zhao Z.-J.,Wang Z.,Wei J.-J.,Han Z.

Funder

National Natural Science Foundation

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference36 articles.

1. High-Performance High- T c Superconducting Wires

2. In‐plane aligned YBa2Cu3O7−xthin films deposited on polycrystalline metallic substrates

3. Temperature and RE elemental dependence for ZrO2–RE2O3 oxide film growth by IBAD method

4. Deposition of in-plane textured MgO on amorphous Si3N4 substrates by ion-beam-assisted deposition and comparisons with ion-beam-assisted deposited yttria-stabilized-zirconia

5. Coated conductors textured by ion-beam assisted deposition

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