Removal of doped poly(methylmetacrylate) from tungsten and titanium substrates by femto- and nanosecond laser cleaning-Reference-Cited by-同舟云学术

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Removal of doped poly(methylmetacrylate) from tungsten and titanium substrates by femto- and nanosecond laser cleaning

Published:2006-04 Issue:13 Volume:252 Page:4754-4758
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Urech L.,Lippert T.,Wokaun A.,Martin S.,Mädebach H.,Krüger J.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference17 articles.

1. Laser Cleaning,2002

2. Polymer resist materials for excimer ablation lithography

3. Proc. SPIE;Suzuki,1997

4. Chemical and Spectroscopic Aspects of Polymer Ablation: Special Features and Novel Directions

5. Femto- and nanosecond laser treatment of doped polymethylmethacrylate

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