Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules-Reference-Cited by-同舟云学术

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Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules

Published:2021-02 Issue: Volume:539 Page:148247
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Lee Jeong-Min,Lee Jinseon,Han Ji Won,Park Hwanyeol,Kyung SeJin,Kim Il Woo,Lee Jong Myeong,Park Tae Joo,Kim Woo-Hee

Funder

Hanyang University

Ministry of Trade, Industry and Energy

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference29 articles.

1. H.-B.-R. Lee, S.F. Bent, Nanopatterning by Area-Selective Atomic Layer Deposition, in: Atomic Layer Deposition of Nanostructured Materials, Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany, 2012, pp. 193–225.

2. Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching;Vos;Chem. Mater.,2019

3. Applications of atomic layer deposition to nanofabrication and emerging nanodevices;Kim;Thin Solid Films,2009

4. A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation;Kim;ACS Nano,2016

5. Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning;Fang;ACS Nano,2015

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