In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma-Reference-Cited by-同舟云学术

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In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma

Published:2021-03 Issue: Volume:542 Page:148684
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Fraxedas Jordi,Schütte Max,Sauthier Guillaume,Tallarida Massimo,Ferrer Salvador,Carlino Vincent,Pellegrin Eric

Funder

Ministerio de Economía y Competitividad

Generalitat de Catalunya

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference48 articles.

1. Investigation of carbon contamination of mirror surfaces exposed to synchrotron radiation;Boller;Nucl. Instrum. Methods Phys. Res.,1983

2. Carbon contamination of soft X-ray beamlines: Dramatic anti-reflection coating effects observed in the 1 keV photon energy region;Chauvet;J. Synchrotron Radiat.,2011

3. In situ optical element cleaning with photon activated oxygen;Warburton;Nucl. Inst. Methods Phys. Res. A,1992

4. In situ removal of carbon contamination from optics in a vacuum ultraviolet and soft X-ray undulator beamline using oxygen activated by zeroth-order synchrotron radiation;Toyoshima;J. Synchrotron Radiat.,2012

5. In situ reactive cleaning of X-ray optics by glow discharge;Johnson;Nucl. Inst. Methods Phys. Res. A,1988

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