Area selective deposition of silicon by plasma enhanced chemical vapor deposition using a fluorinated precursor-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Area selective deposition of silicon by plasma enhanced chemical vapor deposition using a fluorinated precursor

Published:2020-11 Issue: Volume:531 Page:147305
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Akiki Ghewa,Suchet Daniel,Daineka Dmitri,Filonovich Sergej,Bulkin Pavel,Johnson Erik V.

Funder

Total-LPICM ANR Industrial Chair “PISTOL”

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference24 articles.

1. J. Mulkens, M. Hanna, B. Slachter, W. Tel, M. Kubis, M. Maslow, C. Spence, V. Timoshkov, D. Run, N.W. Everygreen, P. Hillsboro, Patterning control strategies for minimum edge placement error in logic devices (2017) 10145.

2. The use of atomic layer deposition in advanced nanopatterning;Mackus;Nanoscale,2014

3. Selective deposition of Ta 2 O 5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps;Vallat;J. Vac. Sci. Technol. A,2017

4. Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification;Chen;Appl. Phys. Lett.,2005

5. Area-selective ALD with soft lithographic methods: Using self-assembled monolayers to direct film deposition;Jiang;J. Phys. Chem. C,2009

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fluid models calculation of Ar/CF₄ radiofrequency capacitively coupled plasmas;Physica Scripta;2024-07-15

2. From partial data to out-of-sample parameter and observation estimation with diffusion maps and geometric harmonics;Computers & Chemical Engineering;2023-10

3. Analysis of a Thin Tunable Silicon-Based Metamaterial Absorber for Sensing Applications;Silicon;2023-04-19

4. Snakeskin-Inspired Hierarchical Winkled Surface for Ultradurable Superamphiphobic Fabrics via Short-Fluorinated Polymer Reactive Infusion;Advanced Fiber Materials;2022-12-15

5. Superhydrophobic and Electrochemical Performance of CF2-Modified g-C3N4/Graphene Composite Film Deposited by PECVD;Nanomaterials;2022-12-09

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3