Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
Author:
Affiliation:
1. Univ. Grenoble Alpes, LTM-CNRS, F-38000 Grenoble, France and CEA, LETI, Minatec Campus, F-38054 Grenoble, France
2. CEA, LETI, Minatec Campus, F-38054 Grenoble, France
3. Univ. Grenoble Alpes, LTM-CNRS, F-38000 Grenoble, France
Funder
Agence Nationale de la Recherche (ANR)
Seventh Framework Programme (FP7)
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.4965966
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