Anti-reflective porous Ge by open-circuit and lithography-free metal-assisted chemical etching-Reference-Cited by-同舟云学术

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Anti-reflective porous Ge by open-circuit and lithography-free metal-assisted chemical etching

Published:2021-04 Issue: Volume:546 Page:149083
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zhang Yi-Yu,Shin Sang-Ho,Kang Hyeok-Joong,Jeon Sohee,Hwang Soon Hyoung,Zhou Weidong,Jeong Jun-Ho,Li Xiuling,Kim Munho

Funder

Ministry of Science and ICT, South Korea

National Science Foundation

Ministry of Education - Singapore

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference47 articles.

1. Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers;Canham;Appl. Phys. Lett.,1990

2. Luminescence from porous silicon: mechanism debated;Collins;Phys. Today,1997

3. Visible electroluminescence from porous silicon;Koshida;Appl. Phys. Lett.,1992

4. Optical properties of silicon light trapping structures for photovoltaics;Iyengar;Sol. Energy Mater. Sol. Cells,2010

5. Nickel on porous silicon MSM photo-detector and quantum confinement in nanocrystallites structure as methods to reduce dark current;Zerdali;Eur. Phys. J. Appl. Phys.,2013

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2. Rapid fabrication of antireflective structures on ZnS surface by spatial shaping femtosecond laser;Optics & Laser Technology;2024-04

3. Potential monitoring during Ge electrochemical etching: Towards tunable double porosity layers;Electrochimica Acta;2024-01

4. Enhancing the performance of surface-textured Ge Schottky photodetectors using the electroless chemical etching method;Materials Science in Semiconductor Processing;2024-01

5. Efficient surface passivation of germanium nanostructures with 1% reflectance;Nanotechnology;2023-06-13

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