Combined reactive plasma jet-laser etching method for technical optical glass containing metal oxides

Author:

Kazemi FaezehORCID,Arnold Thomas,Lorenz Pierre,Ehrhardt Martin,Zimmer Klaus

Funder

Bundesministerium für Bildung und Forschung

Deutsche Forschungsgemeinschaft

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference30 articles.

1. Process automation in computer controlled polishing;Walker;Adv. Mater. Res.,2016

2. J.A. Menapace, P.J. Davis, W.A. Steele, M.R. Hachkowski, A. Nelson, K. Xin, MRF applications: on the road to making large-aperture ultraviolet laser resistant continuous phase plates for high-power lasers, in: Proc.SPIE, 2007.

3. Ultrahigh-rate plasma jet chemical etching of silicon;Arnold;J. Vacuum Sci. Technol. A-Vacuum Surf. Films,2001

4. Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook;Arnold;Nucl. Instrum. Methods Phys. Res. Sect. a-Accelerat. Spectrom. Detect. Assoc. Equip.,2010

5. Large area smoothing of surfaces by ion bombardment: fundamentals and applications;Frost;J. Phys.: Condens. Matter,2009

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