Electron induced deposition and in situ etching of CrOxCly films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
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1. Damage-free mask repair using electron-beam-induced chemical reactions
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1. Crystallinity-retaining removal of germanium by direct-write focused electron beam induced etching;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-07
2. Focused electron beam induced etching of silicon by chlorine gas: Negative effects of residual gas contamination on the etching process;Journal of Applied Physics;2010-12-15
3. Focused electron beam induced etching of silicon using chlorine;Nanotechnology;2010-06-28
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5. A critical literature review of focused electron beam induced deposition;Journal of Applied Physics;2008-10-15
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