Focused electron beam induced etching of silicon using chlorine-Reference-Cited by-同舟云学术

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Focused electron beam induced etching of silicon using chlorine

Published:2010-06-28 Issue:28 Volume:21 Page:285306
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Roediger P,Hochleitner G,Bertagnolli E,Wanzenboeck H D,Buehler W

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/21/i=28/a=285306/pdf

Reference18 articles.

1. Direct writing onto Si by electron beam stimulated etching

2. Focused electron-beam-induced etching of silicon dioxide

3. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

4. The etching of silicon with XeF2vapor

5. Gas assisted focused electron beam induced etching of alumina

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1. SiO₂ etching and surface evolution using combined exposure to CF₄/O₂ remote plasma and electron beam;Journal of Vacuum Science & Technology A;2022-12

2. Emerging Etching Technologies;Atomic Layer Processing;2021-04-28

3. Advances of the top-down synthesis approach for high-performance silicon anodes in Li-ion batteries;Journal of Materials Chemistry A;2021

4. Fabrication and Characterization of MWCNT-Based Bridge Devices;IEEE Transactions on Nanotechnology;2017-11

5. Electron Beam Etching of CaO Crystals Observed Atom by Atom;Nano Letters;2017-07-26

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