Mass spectrometric study of photo dissociation of organic molecules by vacuum-ultraviolet irradiation for development of analysis technique-Reference-Cited by-同舟云学术

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Mass spectrometric study of photo dissociation of organic molecules by vacuum-ultraviolet irradiation for development of analysis technique

Published:2009-09 Issue:24 Volume:255 Page:9861-9863
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Wasamoto M.,Katto M.,Kaku M.,Kubodera S.,Yokotani A.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference7 articles.

1. Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen

2. Cluster SIMS using metal cluster complex ions

3. XPS, EPMA and microstructural analysis of a defective industrial plasma-nitrided steel

4. Mass Spectroscopy – Principles and Applications;De Hoffman,1996

5. Cross Sections for Collisions of Electrons and Photons with Oxygen Molecules

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2. Surface analysis by photo-stimulated desorption using tunable VUV radiation;Applied Physics B;2015-04-02

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4. Enhancement of Extreme Ultraviolet Emission Intensity from a Laser-Produced Plasma Using an Alloy Target;Electronics and Communications in Japan;2014-06-09

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