Using sputtering parameters to mitigate argon ion sputtering induced reduction of nickel in XPS
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Published:2024-06
Issue:
Volume:659
Page:159876
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ISSN:0169-4332
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Container-title:Applied Surface Science
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language:en
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Short-container-title:Applied Surface Science
Author:
Moore CraigORCID,
Moon JeremyORCID,
Chidambaram DevORCID
Funder
NSF
ARPA-E
US DOE NE
Reference24 articles.
1. “Review on surface-characterization applications of X-ray photoelectron spectroscopy (XPS): recent developments and challenges,”;Krishna;Appl. Surf. Sci. Adv.,2022
2. “Chemical degradation of selected zn-based corrosion products induced by C60 cluster, ar cluster and Ar+ ion sputtering in the focus of X-ray photoelectron spectroscopy (XPS),”;Steinberger;Appl. Surf. Sci.,2017
3. “New horizons in sputter depth profiling inorganics with giant gas cluster sources: niobium oxide thin films,”;Ellsworth;Surf. Interface Anal.,2017
4. “Compositional changes induced by 3.5 keV Ar+ ion bombardment in ni-ti oxide systems: a comparative study,” (in en);González-Elipe;Surf. Sci.,1989
5. An XPS study of the Ar+-induced reduction of Ni2+ in NiO and ni-si oxide systems;González-Elipe;Appl. Surf. Sci.,1991