Combined impact of B2H6 flow and growth temperature on morphological, structural, optical, and electrical properties of MOCVD-grown B(In)GaAs heterostructures designed for optoelectronics

Author:

Hidouri Tarek,Parisini Antonella,Ferrari ClaudioORCID,Orsi DavideORCID,Baraldi Andrea,Vantaggio SalvatoreORCID,Nasr SamiaORCID,Bosio Alessio,Pavesi Maura,Saidi Faouzi,Fornari Roberto

Funder

Ministero degli Affari Esteri e della Cooperazione Internazionale

Deanship of Scientific Research, King Faisal University

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference37 articles.

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2. Melt growth and properties of B6P crystals;Slack;J. Phys. Chem. Solids,1983

3. Refractory semiconductor of boron phosphide;Kumashiro;J. Mater Research,1990

4. T.L. Aselage et D. Emin, Brevet US n° : 6, 479,919. 12 novembre 2002.

5. Photoluminescence properties and high resolution x-ray diffraction investigation of BInGaAs/GaAs grown by the metalorganic vapour phase epitaxy method;Hamila;Int. J. Appl. Phys.,2012

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