Anti-adhesion treatment for nanoimprint stamps using atmospheric pressure plasma CVD (APPCVD)

Author:

Wu Chien-Li,Yang Cho-Yun,An Tai-Pang,Lin Je-Wei,Sung Cheng-Kuo

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference21 articles.

1. Atomic-scale friction in direct imprinting process molecular dynamics simulation;Hsieh;Japanese Journal of Applied Physics,2007

2. Contact angles in a thermal imprint process;Bogdanski;Journal of Vacuum Science and Technology B,2008

3. Assessment of release properties in UV nanoimprint lithography using high-aspect-ratio nanoscale molds;Takahashi;Journal of Vacuum Science and Technology B,2010

4. Anti-sticking treatment for a nanoimprint stamp;Sun;Applied Surface Science,2008

5. Mold surface treatment for imprint lithography;Hirai;Journal of Photopolymer Science and Technology,2001

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