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EXAFS study on yttrium oxide thin films deposited by RF plasma enhanced MOCVD under the influence of varying RF self-bias

  • Published:2014-09 Issue: Volume:314 Page:400-407
  • ISSN:0169-4332
  • Container-title:Applied Surface Science
  • language:en
  • Short-container-title:Applied Surface Science

Author:

Chopade S.S.,Nayak C.,Bhattacharyya D.,Jha S.N.,Tokas R.B.,Sahoo N.K.,Patil D.S.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference21 articles.

1. Optical and structural characteristics of Y2O3 thin films synthesized from yttrium acetylacetonate;Alarcón-Flores;J. Mater. Sci.,2008

2. Chemical vapor deposition of Y2O3 films using Y(dpm)3;Bakovets;Inorg. Mater.,2002

3. Yttrium oxide films prepared by pulsed laser deposition;Zhang;J. Appl. Phys.,1998

4. RF plasma MOCVD of Y2O3 thin films: effect of RF self-bias on the substrates during deposition;Chopade;Appl. Surf. Sci.,2013

5. X-Ray Absorption: Principles, Applications, Techniques of EXAFS, SEXAFS and XANES;Konigsberger,1988

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