Characterization of Ti–Zr–N films deposited by cathodic vacuum arc with different substrate bias-Reference-Cited by-同舟云学术

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Characterization of Ti–Zr–N films deposited by cathodic vacuum arc with different substrate bias

Published:2008-04 Issue:13 Volume:254 Page:3909-3914
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Niu E.W.,Li L.,Lv G.H.,Chen H.,Li X.Z.,Yang X.Z.,Yang S.Z.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference27 articles.

1. Systematic study of the evolution of texture and electrical properties of ZrNx thin films by reactive DC magnetron sputtering

2. Hard multilayer coatings containing TiN and/or ZrN: A review and recent progress in their nanoscale characterization

3. Influence of substrate bias on the structure and properties of ZrN films deposited by cathodic vacuum arc

4. Structure-hardness relations in sputtered Ti–Al–V–N films

5. Microhardness and structural analysis of (Ti,Al)N, (Ti,Cr)N, (Ti,Zr)N and (Ti,V)N films

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3. Phase Composition, Hardness, and Thermal Shock Properties of AlCrTiN Hard Films with High Aluminum Content;Coatings;2023-03-03

4. Characterization of TiZrN and TaZrN Nanocomposite Multilayer Coating Deposited via RF/DC Magnetron Sputtering on AISI4140 Steel;Advances in Materials Science and Engineering;2021-12-22

5. Investigation of the tribological properties of Ti-TiN-(Ti,Al,Nb,Zr)N composite coating and its efficiency in increasing wear resistance of metal cutting tools;Tribology International;2021-12

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