Influence of nitrogen flow rate on microstructural and nanomechanical properties of Zr–N thin films prepared by pulsed DC magnetron sputtering-Reference-Cited by-同舟云学术

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Influence of nitrogen flow rate on microstructural and nanomechanical properties of Zr–N thin films prepared by pulsed DC magnetron sputtering

Published:2013-09 Issue: Volume:280 Page:117-123
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Singh Akash,Kuppusami P.,Khan Shabana,Sudha C.,Thirumurugesan R.,Ramaseshan R.,Divakar R.,Mohandas E.,Dash S.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference56 articles.

1. Transition Metal Carbides and Nitrides;Toth,1971

2. Electrical properties of AlN thin films prepared by ion beam enhanced deposition

3. The influence of hydrogen in the nitriding gas on the strength, structure and composition of reaction-sintered silicon nitride

4. Oxidation of titanium nitride in room air and in dry O2

5. Molybdenum Nitride Catalysts

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