Novel pathways for elimination of chlorine atoms from growing Si(100) surfaces in CVD reactors-Reference-Cited by-同舟云学术

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Novel pathways for elimination of chlorine atoms from growing Si(100) surfaces in CVD reactors

Published:2018-05 Issue: Volume:441 Page:773-779
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kunioshi Nílson,Hagino Sho,Fuwa Akio,Yamaguchi Katsunori

Funder

Mitsubishi Materials Corporation

Waseda University

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference23 articles.

1. Vapor phase epitaxy;Lemiti,2009

2. Chloride-based CVD growth of silicon carbide for electronic applications;Pedersen;Chem. Rev.,2002

3. High temperature reactions in the silicon-hydrogen-chlorine system;Sirtl;J. Electrochem. Soc.,1974

4. Rate-determining reactions and surface species in CVD of silicon. I. The SiH4–HCl–H2 system;Bloem;J. Cryst. Growth,1980

5. Rate-determining reactions and surface species in CVD of silicon. II. The SiH2Cl2–H2–N2–HCl system;Claassen;J. Cryst. Growth,1980

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1. Pressure Dependence of Rate Coefficients of Unimolecular and Chemical Activation Reactions Connected to the Potential Energy Wells of Si₂H₂Cl₄, Si₂Cl₆, and Si₂Cl₄ via Rice–Ramsperger–Kassel–Marcus Calculations;The Journal of Physical Chemistry A;2022-11-13

2. Crystal facet dependence of SiHCl3 reduction to Si mechanism on silicon rod;Applied Surface Science;2022-04

3. Pressure dependence of rate coefficients of unimolecular and chemical activation reactions connected to the potential energy wells of chlorinated monosilanes by RRKM calculations;International Journal of Chemical Kinetics;2021-05-17

4. Graphene Oxide Aerosol Deposition and its Influence on Cancer Cells. Preliminary Results;Materials;2020-10-08

5. The effect of chlorine vacancy in CuCl2 (0 0 1) catalyst on the mechanism of SiCl4 dissociation into SiHCl3: A DFT study;Applied Surface Science;2020-06

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