Author:
Seo Dongwan,Park Chanhyoung,Jung Juneui,Yoon Mihyun,Lee Dongwook,Kim Chang Yeol,Lim Sangwoo
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference21 articles.
1. Improved reflectance and stability of Mo–Si multilayers;Bajt;Opt. Eng.,2002
2. Extreme ultraviolet lithography: a review;Wu;J. Vac. Sci. Technol. B,2007
3. Effect of EUV exposure upon surface residual chemicals on EUV mask surface;Lee;Proc. SPIE,2010
4. Carbon contamination of EUV mask: film characterization, impact on lithographic performance, and cleaning;Nishiyama;Proc. SPIE,2008
5. Oxidation and reduction of thin Ru films by gas plasma;Iwasaki;Appl. Surf. Sci.,2007
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