Effect of nitrogen surrounding gas and plasma assistance on nitrogen incorporation in a-C:N films by femtosecond pulsed laser deposition-Reference-Cited by-同舟云学术

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Effect of nitrogen surrounding gas and plasma assistance on nitrogen incorporation in a-C:N films by femtosecond pulsed laser deposition

Published:2016-06 Issue: Volume:374 Page:104-111
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Bourquard F.,Maddi C.,Donnet C.,Loir A.-S.,Barnier V.,Wolski K.,Garrelie F.

Funder

University of Lyon

National Reasearch Agency

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference25 articles.

1. Prediction of new low compressibility solids;Liu;Science,1989

2. Structural properties and electronic structure of low-compressibility materials: Si3N4 and hypothetical C3N4;Liu;Phys. Rev. B,1990

3. Diamond-like carbon (DLC) films as electrochemical electrodes;Zeng;Diamond Relat. Mater.,2014

4. Experimental realization of the covalent solid carbon nitride;Niu;Science,1993

5. Carbon nitride films by RF plasma assisted PLD: spectroscopic and electronic analysis;Cappelli;Appl. Surf. Sci.,2011

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