Fluorine, chlorine and iodine adsorption on the Ge(001) surface: Comparative study for the coverage of 0.75 and 1 monolayer
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference29 articles.
1. Chemisorption and thermally activated etching of Si(100)-2×1 by iodine
2. Cl2dissociation onSi(100)−(2×1):A statistical study by scanning tunneling microscopy
3. Chemisorption of Cl on the Si(100)-2×1 surface
4. First-principles study of chlorine adsorption and reactions onSi(100)
5. First-principles molecular-dynamics calculations and STM observations of dissociative adsorption of Cl2 and F2 on Si(001) surface
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1. Coverage-dependent adsorption and stability of functionalized Ge(1 0 0) and (1 1 1) surfaces;Applied Surface Science;2022-01
2. The process of dissociative adsorption of fluorine on Ge(001) surface;Applied Surface Science;2016-10
3. Halogen diffusion on a Ga-stabilized ζ-GaAs(001)–(4 × 2) surface;Semiconductors;2016-09
4. The process of dissociation of Cl2 molecule on the Ge(001)-p(1×2) surface;Applied Surface Science;2015-04
5. Ab-initio Study of Cation-rich InP(001) and GaP(001) Surface Reconstructions and Iodine Adsorption;IOP Conference Series: Materials Science and Engineering;2015-03-09
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