SIMS study of Cu trapping and migration in low-k dielectric films-Reference-Cited by-同舟云学术

SIMS study of Cu trapping and migration in low-k dielectric films

Author:

Li Yupu,Hunter Jerry,Tate Tom J.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference5 articles.

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4. W. Jost, Diffusion in Solids, Liquid, Gases, Academic Press, New York, 1960.

5. H.F. Wolf (Ed.), Silicon Semiconductor Data, Pergamon Press, New York, 1969.

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