Crystallization kinetics of hydrogenated amorphous silicon thick films grown by plasma-enhanced chemical vapour deposition-Reference-Cited by-同舟云学术

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Crystallization kinetics of hydrogenated amorphous silicon thick films grown by plasma-enhanced chemical vapour deposition

Published:2004-11 Issue:1-4 Volume:238 Page:165-168
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Farjas J.,Rath Chandana,Roura P.,Roca i Cabarrocas P.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference17 articles.

1. Amorphous Silicon Sensor Arrays for X-Ray and Document Imaging

2. L.L. Kazmerski, Polysilicon and Amorphous Thin Film Devices, Academic Press, New York, 1980.

3. T.I. Kamins, Polycrystalline Silicon for Integrated Circuit Applications, Kluwer Academic Publishers, Boston, 1988.

4. Large grain polycrystalline silicon by low‐temperature annealing of low‐pressure chemical vapor deposited amorphous silicon films

5. Crystal grain nucleation in amorphous silicon

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