Growth of Ti and TiSi2 films on Si(111) by low energy Ti+ beam deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference34 articles.
1. Ion-beam-induced silicidation and its use in very-large-scale integration processing
2. Phase formation in the interfacial reactions of ultrahigh vacuum deposited titanium thin films on (111)Si
3. Morphology of TiSi2 and ZrSi2 on Si(100) and (111) surfaces
4. Surface nucleation of Ti silicides at elevated temperatures
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