Population analysis study of etching processes at Si(100) surfaces with adsorbed halogens and hydrogens
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference32 articles.
1. Surface science aspects of etching reactions
2. Surface-science aspects of plasma-assisted etching
3. Chlorine chemisorption on silicon and germanium surfaces: Photoemission polarization effects with synchrotron radiation
4. Bonding sites for Cl on Si(100)2 × 1 and Si(111)7 × 7
5. Chlorine bonding sites and bonding configurations on Si(100)–(2×1)
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