Photoemission study of the iron-induced chemical reduction of silicon native oxide-Reference-Cited by-同舟云学术

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Photoemission study of the iron-induced chemical reduction of silicon native oxide

Published:2003-06 Issue:1-3 Volume:536 Page:130-138
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Garnier M.G.,de los Arcos T.,Boudaden J.,Oelhafen P.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference29 articles.

1. The structure and properties of metal-semiconductor interfaces

2. Rare earth metal-SiO2-Si interfaces monitored by Auger spectroscopy

3. Physical and chemical effects at rare-earth-metal-SiO2–Si structures

4. Reaction of thin metal films with SiO2 substrates

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Adsorption and reaction of silver on an oxidized Si(001) surface;Journal of Electron Spectroscopy and Related Phenomena;2015-08

2. Influence of nanometer-sized interface on reaction of iron nanocrystals epitaxially grown on silicon substrates with oxygen gas;Journal of Applied Physics;2013-09-21

3. Adsorption and reaction of titanium on an oxidized Si(001) surface;Journal of Electron Spectroscopy and Related Phenomena;2013-08

4. Interaction of iron atoms with the silicon surface coated with a native oxide layer;Technical Physics;2009-08

5. Influence of defects in a silicon dioxide thin layer on the processes of silicidation in the Fe/SiO2/Si(001) system;Physics of the Solid State;2009-03

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