Surface diffusion kinetics on amorphous silicon-Reference-Cited by-同舟云学术

Surface diffusion kinetics on amorphous silicon

Published:2001-11 Issue:1 Volume:494 Page:L761-L766
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Dalton A.S,Llera-Hurlburt D,Seebauer E.G

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference29 articles.

1. Estimating surface diffusion coefficients

2. Landolt–Börnstein Numerical Data and Functional Relationships: Diffusion in Semiconductors, vol. III/33A;Seebauer,1998

3. Landolt–Börnstein Numerical Data and Functional Relationships: Surface Diffusion on Metals, Semiconductors, and Insulators, vol. III/42;Seebauer,2001

4. Improvement of properties of dynamic random access memories capacitors by PH[sub 3] plasma doping process after the formation of hemispherical-grained silicon

5. Hemispherical grained Si formation on in-situ phosphorus doped amorphous-Si electrode for 256 Mb DRAM's capacitor

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