Modeling and simulation of thermal chlorine etching of gallium arsenide with application to real-time feedback control
Author:
Publisher
Elsevier BV
Subject
Computer Science Applications,Modeling and Simulation
Reference15 articles.
1. Intelligent model-based control system employing in-situ ellipsometry;Butler;Journal of Vacuum Science Technology,1994
2. End point and etch rate control using dual-wavelength laser reflectometry with a nonlinear estimator;Vincent;Journal of the Electrochemical Society,1997
3. Integration of in-situ spectral ellipsometry with MMST machine control;Maung;IEEE Transactions on Semiconductor Manufacturing,1994
4. High speed spectral ellipsometry for in-situ diagnostics and process control;Duncan;J. Vac. Sci. Technol.,1994
5. In-situ spectral ellipsometry for real time thickness measurement: Etching multilayer stacks;Henck;J. Vac. Sci. Technol.,1993
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Dry etching of TiN in N2/Cl2/Ar adaptively coupled plasma;Vacuum;2011-11
2. Modeling of the chemically assisted ion beam etching process: Application to the GaAs etching by Cl2∕Ar+;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2007-01
3. Chemically assisted ion beam etching of GaAs by argon and chlorine gases: Experimental and simulation investigations;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005
4. CONTROL PROBLEM CLASSIFICATION FOR A PLASMA PROCESS;IFAC Proceedings Volumes;2005
5. An Elementary Model for Control of a Semiconductor Etching Process;SIAM Review;2002-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3