Optical and structural properties of amorphous silicon-nitrides and silicon-oxycarbides: Application of multilayer structures for the coupling of Bloch Surface Waves-Reference-Cited by-同舟云学术

Optical and structural properties of amorphous silicon-nitrides and silicon-oxycarbides: Application of multilayer structures for the coupling of Bloch Surface Waves

Published:2016-12 Issue: Volume:453 Page:113-117
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Mandracci Pietro,Frascella Francesca,Rizzo Riccardo,Virga Alessandro,Rivolo Paola,Descrovi Emiliano,Giorgis Fabrizio^ORCID

Funder

BILOBA

NANOMAX

NEWTON

PHOENICS

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference44 articles.

1. Characterization of low-dielectric-constant SiOC thin films deposited by PECVD for interlayer dielectrics of multilevel interconnection;Kim;Surf. Coat. Technol.,2003

2. Low temperature growth of SiO2 on SiC by plasma enhanced chemical vapor deposition for power device applications;Mandracci;Thin Solid Films,2003

3. Low refraction properties of F-doped SiOC:H thin films prepared by PECVD;Yoon;Thin Solid Films,2008

4. Effects of high-temperature treatment on the hydrogen distribution in silicon oxynitride/silicon nitride stacks for crystalline silicon surface passivation;Schwab;Phys. Status Solidi A,2013

5. Low-k a-SiCO:H films as diffusion barriers for advanced interconnects;Van Besien;Microelectron. Eng.,2014

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