The growth kinetics of silicon nitride deposited from the SiH4–N2 reactant mixture in a remote plasma-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

The growth kinetics of silicon nitride deposited from the SiH4–N2 reactant mixture in a remote plasma

Published:2004-06 Issue: Volume:338-340 Page:37-41
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Kessels W.M.M.,van Assche F.J.H.,van den Oever P.J.,van de Sanden M.C.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Mechanism of SiN x H y Deposition from NH 3 ‐ SiH4 Plasma

2. Plasma Deposition of SiNxHy: Process Chemistry vs Film Properties

3. Mechanism of SiNxHy deposition from N2–SiH4 plasma

4. High-rate deposition of a-SiNx:H for photovoltaic applications by the expanding thermal plasma

5. Bulk passivation of multicrystalline silicon solar cells induced by high-rate-deposited (> 1 nm/s) silicon nitride films

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Global optimization of process parameters for low-temperature SiNx based on orthogonal experiments;Advances in Manufacturing;2022-12-20

2. Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches;The Journal of Chemical Physics;2017-02-07

3. Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies;ACS Applied Materials & Interfaces;2017-01-06

4. Chemically active plasmas for surface passivation of Si photovoltaics;Catalysis Today;2015-09

5. Evolution of optical properties with deposition time of silicon nitride and diamond-like carbon films deposited by radio-frequency plasma-enhanced chemical vapor deposition method;Thin Solid Films;2011-07

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3