Ion implantation induced structural changes in reactively sputtered Cr-N layers on Si substrates
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference12 articles.
1. Characterization of thick chromium-carbon and chromium-nitrogen films deposited by hollow cathode discharge
2. Hard chrome coatings deposited by physical vapour deposition
3. Cracking resistance of thin hard coatings estimated by four-point bending
4. Stress and structure profiles for chromium nitride coatings deposited by r.f. magnetron sputtering
5. Ion assisted deposition of titanium chromium nitride
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1. Surface, structural, electrical and mechanical modifications of pulsed laser deposited ZrN thin films by implantation of MeV carbon ions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-06
2. Correlation between damage evolution, structural and optical properties of Xe implanted CrN thin films;Processing and Application of Ceramics;2018
3. Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature;Journal of Alloys and Compounds;2017-12
4. Structural, optical and electrical properties of reactively sputtered CrxNy films: Nitrogen influence on the phase formation;Processing and Application of Ceramics;2017
5. Effects of 200 keV Ar-ions irradiation on the structural and optical properties of reactively sputtered CrN films;Optical Materials;2016-12
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