Fluoride thin film formation with low optical absorption by gas cluster ion beam assisted deposition-Reference-Cited by-同舟云学术

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Fluoride thin film formation with low optical absorption by gas cluster ion beam assisted deposition

Published:2007-08 Issue:1-2 Volume:261 Page:656-659
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Nakazawa S.,Toyoda N.,Mochiji K.,Mitamura T.,Yamada I.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference12 articles.

1. Optical Thin Film Formation with O2Cluster Ion Assisted Deposition

2. Nanofabrication technology by gas cluster ion beams

3. Surface treatment of diamond films with Ar and O2 cluster ion beams

4. Reactive sputtering by SF6 cluster ion beams

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sputtering Yields for Gold Using Argon Gas Cluster Ion Beams;The Journal of Physical Chemistry C;2012-10-24

2. Nonlinear absorption in single LaF_3 and MgF_2 layers at 193 nm measured by surface sensitive laser induced deflection technique;Applied Optics;2009-12-03

3. Extremely low-energy projectiles for SIMS using size-selected gas cluster ions;Applied Surface Science;2008-12

4. Metal fluoride coatings prepared by ion-assisted deposition;Advances in Optical Thin Films III;2008-09-19

5. Gas Cluster Ion Beam Equipment and Applications for Surface Processing;IEEE Transactions on Plasma Science;2008-08

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