Low-energy O+ or SiO+ ion beam induced deposition of silicon oxide using hexamethyldisiloxane
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Published:2024-04
Issue:
Volume:549
Page:165276
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ISSN:0168-583X
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Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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language:en
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Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Author:
Yoshimura SatoruORCID,
Takeuchi Takae,
Kiuchi Masato
Cited by
1 articles.
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