Effects of implantation temperature and thermal annealing on the Ga+ ion beam induced optical contrast formation in a-SiC:H

Author:

Tsvetkova T.,Wright C.D.,Kitova S.,Bischoff L.,Zuk J.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference16 articles.

1. Amorphous and Crystalline Silicon Carbide;Powell,1989

2. Ion Implantation;Ziegler,1988

3. Crystalline-amorphous contrast formation in thermally crystallized SiC

4. Beam Processing of Advanced Materials;Tsvetkova,1996

5. Near-field optical mapping of the ion-implanted patterns fabricated in amorphous silicon carbide

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Nanoscale Optical Patterning of Amorphous Silicon Carbide for High-Density Data Archiving;Multilayer Thin Films - Versatile Applications for Materials Engineering;2020-01-15

2. Surface characterisation of Ga+ion implanted ta-C thin films;Journal of Physics: Conference Series;2017-01

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